most searched tags
Infrastructure - "All"
OPAL/TSUANMI/MILLENNIA Laser system from Spectra Physcis
With an electron beam a pattern is written in a photoresist layer. After exposure to this beam it is possible to selectively remove either exposed or non-exposed regions of the resist with chemical...
NUV optical lithography system with 365 nm exposure wavelength. Patern resolution of sub micron in contact mode.
By tightly focusing the light of an ultra-short pulsed laser, the intensity within the very focus is sufficiently high to expose the photoresist by two-photon absorption. This process causes a chem...
Suss Delta 80 Spin coater
Magnetron sputter coater
Oxford Plasmalab 80+ Ion beam etching
Alpha-step surface profiler